| Concept URI | http://www.eionet.europa.eu/gemet/concept/6327 |
|---|---|
| Preferred label | plasma technology |
| Definition | 1) Common name for a number of industrial applications of plasma, such as: etching of semiconductor chips, deposition of silicon for solar cell production, deposition of silicon dioxide for passivation of surfaces, activation of surfaces, melting and welding with plasma arcs as well as plasma chemistry. 2) Plasma technology consists of minute gas-filled cells, which emit light when an electric current is channelled through them. |
| Notation | |
| Status | Valid |
| Status Modified | 2013-12-05 |
| Accepted Date | 2013-12-05 |
| Not Accepted Date | |
| Has broader | |
| Has close match | |
| Source |
European Environment Agency
Kgs. Nytorv 6, DK-1050 Copenhagen K, Denmark